Evaluating the thickness of a layer or determining

专利名称：Evaluating the thickness of a layer or

determining change in thermal

characteristics with depth by thermal wavedetection

发明人：Rosencwaig, Allan申请号：EP83303411.9申请日：19830613公开号：EP0097473A1公开日：19840104

摘要：To non-destructively determine the thickness of layers deposited on asubstrate by analyzing thermal waves generated in a sample, especially in integratedcircuit manufacturing, the sample is subjected to heat from a focused periodic heatsource which generates thermal waves and either the magnitude or phase of the thermalwaves generated in the sample is measured. The values obtained are normalized relativeto a reference sample. The normalized values are analyzed with respect to a theoreticalmodel of the sample to calculate the thickness of the unknown layers. Alternatively,thermal characteristics can be determined in a sample as a function of depth. The latterapproach is useful for non-destructively determining dopant concentrations or latticedefects in semicondutor devices as a function of depth beneath the surface.

申请人：THERMA-WAVE INC.

地址：47734 Westinghouse Drive Fremont California 94539 US

国籍：US

代理机构：Jackson, David Spence

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